Hydrogen is a chemical element; it has symbol H and atomic number 1. It is the lightest element and, at standard conditions, is a gas of diatomic molecules with the formula H₂, sometimes called dihydrogen, but more commonly called hydrogen gas, molecular hydrogen or simply hydrogen.
Hydrogen (H2) plays a multifaceted role in semiconductor fabrication, contributing to the cleaning, etching, deposition, annealing, passivation, ion implantation, and plasma processing stages of production.
TPS provides a total solution for design, QRA, HAZOP, authority submission, bidding, construction management, testing and commissioning, and obtaining a flammable storage gas license.
Total Process Systems (TPS)Pte Ltd
Civil, Structure & Architecture (CSA)
200mm RC WALL (4Hrs Fire Rated) – 3 sides Passive Fire Protection.
4 Hrs Roller Shutter- Front Passive Fire Protection.
Open to atmosphere at the top. (Trailer Area)
Light roof shelter for piping manifold area,
Set Back from Boundary Line – 4.5m
FIRE
UV IR Sensors (minimum 2 nos) and activate the Deluge Systems.
Manual Call Point., Fire Alarm ( Bell & Strobe) and Link to Overall Fire Alarm Systems.
Hose Reel
Fire Extinguisher
Fire Hydrant
LIFE SAFETY SYSTEMS
H2 Gas Detectors to be provided at Trailer Manifold, Piping Manifold area.
EMO Button
SET BACK DISTANC
30m from Air Compressor intakes or HVAC intakes.
EMERGENCY SAFETY SHUTOFF VALVE (ESSV)
Provide ESSV at H2 pipe line.
EXCESS FLOW SWITCH (EFS)
Provide EFS at manifold
ELECTRICAL
Ex-Proof Electrical Fittings
Earthing System for Trailer
DISTRIBUTION PIPING
Outside – Single
Within the Building - COAX
CODE COMPLIANCE
SCDF
BCA
Insurance Company safety requirements
NFPA 55: Compressed Gases and Cryogenic Fluids Code
FM code – Hydrogen 7-91
NFPA 318: Standard for the Protection of Semiconductor Fabrication Facilities
Besides complying to the codes and standards, H2 Systems design additional risk reduction measures to reduce the risk to ALARP level
Secondary containment gas piping is a specialized piping system used to transport hazardous gases safely. This system consists of two concentric pipes: an inner pipe that carries the gas and an outer pipe that provides secondary containment.
Trichlorosilane (SiHCl3) is a chemical compound that consists of silicon, hydrogen, and chlorine atoms. Trichlorosilane (TCS) is a key chemical used in the semiconductor industry, particularly in the production of high-purity silicon for the manufacturing of electronic components.
Ammonia (NH3) is a versatile chemical in semiconductor fabrication, used for cleaning, etching, deposition, doping, and pH control. Its effective use requires careful management to ensure both operational efficiency and safety.
