Gas

Secondary containment gas piping is a specialized piping system used to transport hazardous gases safely. This system consists of two concentric pipes: an inner pipe that carries the gas and an outer pipe that provides secondary containment.

Trichlorosilane (SiHCl3) is a chemical compound that consists of silicon, hydrogen, and chlorine atoms. Trichlorosilane (TCS) is a key chemical used in the semiconductor industry, particularly in the production of high-purity silicon for the manufacturing of electronic components.

Ammonia (NH3) is a versatile chemical in semiconductor fabrication, used for cleaning, etching, deposition, doping, and pH control. Its effective use requires careful management to ensure both operational efficiency and safety.

Hydrogen (H2) plays a multifaceted role in semiconductor fabrication, contributing to the cleaning, etching, deposition, annealing, passivation, ion implantation, and plasma processing stages of production.